TUNGSTEN SILICIDE | CAS No.12039-88-2
Name:TUNGSTEN SILICIDE CAS No.12039-88-2 MF:Si2W MW:240.01 Purity:97% EINECS:234-909-0 Appearance:solid Package: 5g,25g,100g,500g,1kg,25kg Worldwide Delivery
Categories：
Material Chemistry
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Product introduction
Introduction and application of TUNGSTEN SILICIDE | CAS No.12039-88-2
Tungsten silicide is a chemical compound that is used as a polarizer in optical systems. It has been shown to be chemically stable and resistant to hydrogen ions and other reactive substances, which makes it an ideal material for sample preparation and fabrication. Tungsten silicide has high transport properties, which make it suitable for use in optical systems that require polarization of light. Tungsten silicide has a high refractive index, which enables it to be used as an optical system with low dispersion. It also has the ability to withstand high temperatures without degrading or changing its physical properties. Tungsten silicide can be fabricated into profiles of various shapes and diameters. The thermal expansion coefficient is also low enough to prevent any distortion of the optical surface during heating in vacuum or atmospheric pressure.
Synonyms:
TUNGSTENDISILICIDE;
TUNGSTENSILICIDE,-325MESH;
TUNGSTENSILICIDE(99.7%-W);
TUNGSTENSILICIDE,99.995%(METALSBASISEXCLUDINGMO),MO<;
Tungstensilicide,99.995%(metalsbasisexcludingMo),Mo<20ppm;
Tungstensilicide,99.5%(metalsbasis);
TUNGSTENSILICIDE,99%TUNGSTENSILICIDE,99%TUNGSTENSILICIDE,99%
Specification of TUNGSTEN SILICIDE | CAS No.12039-88-2
|
ITEMS |
SPECIFICATION |
|
CAS |
12039-88-2 |
|
MF |
Si2W |
|
MW |
240.01 |
|
EINECS |
234-909-0 |
|
Melting point |
2165°C |
|
Density |
9,88 g/cm3 |
Package and transportation of Introduction and application of TUNGSTEN SILICIDE | CAS No.12039-88-2
Package:100g; 500g; 1kg; 25kg;bulk package
Transportation: by courier/ by air/ by sea
Related Articles of TUNGSTEN SILICIDE | CAS No.12039-88-2
Chemical vapor deposition of tungsten silicide (WSix) for high aspect ratio applications
B Sell, A Sänger, G Schulze-Icking, K Pomplun… - Thin Solid Films, 2003 - Elsevier
Chemical vapor deposition of tungsten silicide into high aspect ratio trenches … tungsten
hexafluoride (WF 6 ) has been identified as a suitable chemistry to fill deep trenches with tungsten …
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